Automatic Wafer Cleaning Device After Light Resistance
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Automatic Wafer Cleaning Device After Light Resistance Product Description Application field: removal of photoresistance/wafer cleaning after grinding Wafer size: 150mm&200mm&300mm (customizable) Process indicators: wafers with processes above 19nm can be cleaned Automatic Wafer Plating Machine features: Equipped with 2 or 3 Load ports Industrial control machine touch screen operation control, convenient and fast Use genuine industrial iot configuration software for control and monitoring Support SECS/GEM communication protocol and data transmission Horizontal chamber, no cross contamination Equipped with two-arm wafer handling manipulator imported from Japan, efficient and stable Equipped with up to 8 cleaning chambers (customized) Cleaning liquid independent control, no cross contamination Equipped with nozzle liquid flow accurate control system Our products are very popular, if you are interested in our products, please contact JuYongNeng as soon as possible.
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